Abstract:
Nowadays, reduction of power consumption is an essential requirement of electronic industry. So researchers and engineers have searched for new methods and have proposed new device structures to reduce the power consumption of electronic devices and circuits. Tunneling FETs with their special structure and operation, provide power consumption reduction with power supply reduction. TFETs have significant privilege over CMOS technology especially in digital circuits. They can be a suitable replacement for CMOS transistors. Hence, improving the performance of TFETs is a necessary task.
This work presents the improvement in the main electrical characteristics of two types of TFET. Heterogeneous gate dielectric is used in a nanoscale symmetric U-shaped gate tunnel FET (SUTFET), which resulted in ION, IOFF, subthreshold swing (SS), and Iambipolar enhancement. ION of 1.5×10-5 A/μm, IOFF of 6×10-12 A/μm, average subthreshold swing of (SS) 19.83 mV/decade from 0V
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