چكيده به لاتين
Microelectronics laboratories and nanotechnology clean-rooms, utilize Electron Microscope Imaging to enhance the quality and conceptual analysis of nano-layers, due to it’s high resolution. Electron beam lithography,that is another essential tool for microelectronics laboratories is a system similar to electron microscope. In this thesis, first, the components of an electron microscope are studied and then the electron gun, that is an essential part of the system, is designed and fabricated. In this way, our goal is to achieve very low cost electron gun, with good performance. The effort is to reduce the spherical aberration factor and increasing the electron brightness. To test the fabricated gun, we have designed and fabricated a vacuum chamber using stainless steel. Two stage vacuuming has been adopted using a rotary vane and a diffusion pump. The required high voltage vacuum feed-through connections are made by car spark plug. The final vacuum pressure measured in the chamber is 10e−5 𝑇𝑜𝑟𝑟 , which is excellent for the thermionic electron source. The fabricated electron column includes copper electrostatic lens, bras Wehnelt anode and alumina electrostatic lens holder. Alumina is used as an electrical insulation.
