شبنم ميرزانژاد

Microwave plasma-enhanced chemical vapor deposition (MPECVD) is a widely used method for coating various materials in industrial applications. Developing technology related to this method requires understanding the plasma used in it. In this thesis, the microwave plasma of hydrogen gas in a conventional reactor has been studied through simulation using COMSOL software. Firstly, by review the literatures, the physics of MPECVD, types of reactors and their applications have been introduced. Then, the theory used in the simulation with COMSOL software has been described. Then, the simulation model and results have been presented. The distribution of the microwave electric field inside the cavity before plasma formation has been calculated for different values of the cavity height to identify the optimal height of the cavity. It was found that at the optimal height, the intensity of the electric field at the top of the sample holder is the highest. Additionally, the plasma density distribution has been calculated for different values of the cavity height, showing that at the optimal height of the cavity, the plasma is concentrated on top of the sample holder. Furthermore, the axial and radial changes of the microwave electric field and the number density of electrons and atomic hydrogen for different cavity heights have been investigated and discussed to more accurately eva‎luate the effect of cavity height on plasma characteristics.

پلاسماي مايكروويو , رسوب شيميايي بخار , شبيه سازي

Microwave plasma , Chemical vapor deposition , Simulation

Shabnam Mirzanejad

Mostafa Salahshoor